Our Standard Low Stress LPCVD nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.
-Wafers Sizes 2,3,&4", contact for 5&6" pricing as well as lower priced Stoichiometric LPCVD Nitride
-Thickness up to 2µm
-Thickness Tolerance ± 7% or better
-Refractive index 2.20 ±0.5
-Film Stress <250MPa Tensile
Prior to LPCVD Nitride deposition all wafers will receive an RCA2 Megasonic Cleaning and a Piranha clean if necessary.
|
Thickness (A) |
Batch Cost for 25 wafers or less |
Per Wafer Cost for batch of 100 |
|
50-1000 |
$660 |
$22.80 |
|
2000 |
$750 |
$26.40 |
|
3000 |
$840 |
$30.00 |
|
4000 |
$930 |
$33.60 |
|
5000 |
$1,020 |
$37.20 |
|
6000 |
$1,100 |
$40.80 |
|
7000 |
$1,200 |
$44.40 |
|
8000 |
$1,290 |
$48.00 |
|
9000 |
$1,380 |
$51.60 |
|
10000 |
$1,470 |
$55.20 |
|
11000 |
$1,560 |
$58.80 |
|
12000 |
$1,650 |
$62.40 |
|
13000 |
$1,740 |
$66.00 |
|
14000 |
$1,830 |
$69.60 |
|
15000 |
$1,920 |
$73.20 |
|
16000 |
$2,010 |
$76.80 |
|
17000 |
$2,100 |
$80.40 |
|
18000 |
$2,190 |
$84.00 |
|
19000 |
$2,280 |
$87.60 |
|
20000 |
$2,370 |
$91.20 |
*Updated / Feb. 2010
|
